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Industriesektor
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Fast-scanning ellipsometry for thin film characterization [4099-39]
Investigations of transmittance and reflectance in the DUV/VUV spectral range [4099-36]
X-ray investigations of a near surface layer of metal samples [4099-33]
Optical testing of long cylindrical lenses by means of scanning deflectometry [4099-17]
Evaluating optical and supersmooth surface using AFM in optical manufacturing technology [4099-07]
Lithography: a look at what is ahead (Invited Paper) [4099-01]
Advanced methods for surface and subsurface defect characterization of optical components [4099-34]
Accuracy of the thin metallic wires diameter using Fraunhofer diffraction technique [4099-31]
Ellipsometry: a sophisticated tool for optical metrology (Invited Paper) [4099-23]
Calibration tool for a CCD-camera-based vision system [4099-19]
DUV/VUV light scattering measurement of optical components for lithography applications [4099-10]
Numerical investigation of the resolution in solid immersion lens systems [4099-28]
Present and future interference microscope systems for magnetic head metrology [4099-21]
Optical microscopy at sub-0.1-mum resolution for semiconductor applications [4099-03]
Microroughness analysis of thin film components for VUV applications [4099-13]
Measurement of steep aspheres: a step forward to nanometer accuracy [4449-25]
IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]