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Polarized light scattering from metallic particles on silicon wafers [4449-39]
Measurement of the elastic constants of nanometric films [4449-16]
AFM tip calibration using nanometer-sized structures induced by ion beam sputtering [4449-28]
Measurement of total integrated scatter of optical coatings for 157-nm lithography [4449-04]
Investigations of transmittance and reflectance in the DUV/VUV spectral range [4099-36]
X-ray investigations of a near surface layer of metal samples [4099-33]
Optical testing of long cylindrical lenses by means of scanning deflectometry [4099-17]
Evaluating optical and supersmooth surface using AFM in optical manufacturing technology [4099-07]
Lithography: a look at what is ahead (Invited Paper) [4099-01]
Numerical investigation of the resolution in solid immersion lens systems [4099-28]
Present and future interference microscope systems for magnetic head metrology [4099-21]
Measurement of steep aspheres: a step forward to nanometer accuracy [4449-25]
IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]
X-ray study of surfaces and interfaces [4449-31]