Wet-oxidation experiments in a nitrogen environment at high temperatures are conducted to improve the photoelectricity performance of the 850nm VCSELs. It is very important to accurately control the oxidation aperture.We have carried out upon the wafer of VCSELs with the same structure by changing the furnace temperature and oxidation time, then micro-probe analyses have been examined at different oxidation depth by scanning electron microscope (SEM) and by X-ray. Oxidation products are examined at different oxidation depths of oxidation layer and each component content is analyzed, we get the law of the wet-oxidation. The oxidation process thermal stability and precision can be improved by lowering the oxidation temperature and prolonging the oxidation time.


    Zugriff

    Zugriff prüfen

    Verfügbarkeit in meiner Bibliothek prüfen

    Bestellung bei Subito €


    Exportieren, teilen und zitieren



    Titel :

    The law of wet oxidation rate in 850nm VCSELs


    Beteiligte:
    Feng, Yuan (Autor:in) / Liu, Guojun (Autor:in) / Yan, Changling (Autor:in) / Hao, Yongqin (Autor:in) / Wang, Yong (Autor:in) / Lu, Peng (Autor:in) / Li, Yang (Autor:in) / Li, Zaijin (Autor:in)

    Kongress:

    Selected Papers from Conferences of the Photoelectronic Technology Committee of the Chinese Society of Astronautics 2014, Part I ; 2014 ; China,China


    Erschienen in:

    Erscheinungsdatum :

    04.03.2015





    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



    850nm VCSELs for 10Gb/s operation

    Iwai, N. / Yokouchi, N. / Kasukawa, A. | IEEE | 2002


    The law of wet oxidation rate in 850nm VCSELs [9521-15]

    British Library Conference Proceedings | 2015


    Growth and characterization of 850nm InGaAsP/InGaP strain-compensated VCSELs by MOCVD

    Kuo, H. C. / Lu, T. C. / Chang, Y. S. et al. | British Library Conference Proceedings | 2003


    Low Thermal Resistance, Low Current Density, High-Speed 980 and 850nm VCSELs

    AL-Omari, A.N. / Carey, G.P. / Hallstein, S. et al. | IEEE | 2006


    New 850nm VCSELs and CD-Type Laser Provide Interoperable Low Cost Data Links

    IEEE / Lasers and Electro-Optics Society | British Library Conference Proceedings | 1995