Progress in high deposition rate amorphous and polycrystalline silicon materials using the pulsed plasma and hot wire CVD deposition techniques
Solar energy materials & solar cells ; 59 , 1-2
1999
Aufsatz (Zeitschrift)
Englisch
Plasma Deposition of Amorphous Silicon
NTRS | 1982
|High-rate deposition of polycrystalline silicon thin films by hot wire cell method using disilane
Online Contents | 2001
|High-rate deposition of hydrogenated amorphous silicon films using inductively coupled silane plasma
Online Contents | 2001
|Plasma Deposition of Doped Amorphous Silicon
NTRS | 1985
|