Energies of neutral particles controllable. Apparatus developed to produce intense beams of reactant atoms for simulating low-Earth-orbit oxygen erosion, for studying beam-gas collisions, and for etching semiconductor substrates. Neutral beam formed by neutralization and reflection of accelerated plasma on metal plate. Plasma ejected from coaxial plasma gun toward neutralizing plate, where turned into beam of atoms or molecules and aimed at substrate to be etched.


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    Titel :

    Plasma/Neutral-Beam Etching Apparatus


    Beteiligte:
    Langer, William (Autor:in) / Cohen, Samuel (Autor:in) / Cuthbertson, John (Autor:in) / Manos, Dennis (Autor:in) / Motley, Robert (Autor:in)

    Erschienen in:

    Erscheinungsdatum :

    1989-05-01



    Medientyp :

    Sonstige


    Format :

    Keine Angabe


    Sprache :

    Englisch


    Schlagwörter :



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