Improved process for fabrication of integrated circuits developed. Technique utilizes simultaneous ion-beam sputter etching and carbon sputter deposition in conjunction with carbon sputter mask or organic mask decomposed to produce carbon-rich sputter-mask surface. Sputter etching process replenishes sputter mask with carbon to prevent premature mask loss.
Masking Technique for Ion-Beam Sputter Etching
NASA Tech Briefs ; 10 , 3
1986-05-01
Sonstige
Keine Angabe
Englisch
Rational unsharp masking technique
British Library Online Contents | 1998
|Sputter Etching Mechanism and Changes of Surface Structure of PTFE
Online Contents | 1993
|