Package of computer programs helps designers with layout and graphics of photomasks. Photomasks are specifically useful to applications involving fine reproducibility, repetition, and fabrication on planar surfaces of materials, items fabricated from photomasks include circuit boards, magnetic bubble devices and integrated optic circuits.


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    Titel :

    Photomask and pattern programs


    Beteiligte:

    Erschienen in:

    Erscheinungsdatum :

    01.04.1980



    Medientyp :

    Sonstige


    Format :

    Keine Angabe


    Sprache :

    Englisch


    Schlagwörter :


    An Automatic Photomask Inspection System

    Afanas'ev, A. N. / Gafarov, R. M. / Egorov, S. F. | British Library Online Contents | 1996



    Computer programs for antenna pattern synthesis

    Mautz, J.R. / Harrington, R.F. | Tema Archiv | 1973


    Defect Classification Algorithm for IC Photomask Based on PCA and SVM

    Chen, Shizhe / Hu, Tao / Liu, Guodong et al. | IEEE | 2008


    Photomask fabrication of focusing diffractive optical elements using electron-beam lithography

    Babin, S. V. / Danilov, V. A. / SPIE | British Library Conference Proceedings | 1995