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    Titel :

    Photomask fabrication of focusing diffractive optical elements using electron-beam lithography



    Kongress:

    9th Meeting, Optical engineering in Israel ; 1994 ; Tel-Aviv; Israel



    Erscheinungsdatum :

    1995-01-01


    Format / Umfang :

    13 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




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