Shape distortion of diffractive optical elements, directly written with electron beam lithography
4th International conference, Holographic systems, components and applications ; 1993 ; Neuchatel; Switzerland
1993-01-01
2 pages
Aufsatz (Konferenz)
Englisch
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Photomask fabrication of focusing diffractive optical elements using electron-beam lithography
British Library Conference Proceedings | 1995
|Proximity-compensated kinoforms directly written by e-beam lithography
British Library Conference Proceedings | 1994
|British Library Conference Proceedings | 2002
|British Library Conference Proceedings | 1997
|