A novel /spl delta/-doped InGaP/InGaAs/AlGaAs tunneling real-space transfer high electron mobility transistor (TRST-HEMT) has been successfully fabricated by low-pressure metal organic chemical vapor deposition. Three-terminal N-shaped negative differential resistance (NDR) phenomenon due to the hot electrons real-space transfer (RST) at high electric field is observed. Two-terminal gate-to-drain breakdown voltage is more than 40 V. High three-terminal on-state breakdown voltage as high as 19.2 V and broad plateau of current valley as high as 15 V are achieved.


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    Titel :

    High breakdown InGaP/InGaAs tunneling real space transfer HEMT


    Beteiligte:
    Yen-Wei Chen, (Autor:in) / Wei-Chou Hsu, (Autor:in)


    Erscheinungsdatum :

    01.01.2002


    Format / Umfang :

    185929 byte





    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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