We present that a sub-diffraction-limited photolithography technique can be theoretically achieved by affiliating an anisotropic metamaterial under the conventional photolithographic mask. Based on the special dispersion characteristics of the metamaterial, only the enhanced evanescent waves with high spatial frequencies can transmit through the metamaterial and engage in the lithography process. Rigorous coupled wave analysis shows that with 442nm exposure light, one-dimensional periodical structures of 40nm feature can be patterned, far beyond the diffraction limit. This technique provides an alternative method to fabricate large-area nanostructures.


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    Titel :

    Interference photolithography with metamaterials


    Beteiligte:
    Xu, Ting (Autor:in) / Wang, Changtao (Autor:in) / Luo, Xiangang (Autor:in)


    Erscheinungsdatum :

    2008-12-01


    Format / Umfang :

    496520 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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