Femtosecond laser ablation of silicon (100) with thermal oxide thin films was studied in order to further understand the ablative properties of thin films and to evaluate their influence on the ablation of the substrate.


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    Titel :

    Femtosecond laser ablation of silicon (100) with thermal oxide thin films of varying thickness


    Beteiligte:
    McDonald, J.P. (Autor:in) / Ray, K.E. (Autor:in) / Mistry, V.R. (Autor:in) / Mourou, G. (Autor:in) / Yalisove, S.M. (Autor:in)


    Erscheinungsdatum :

    2005-01-01


    Format / Umfang :

    2015604 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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