Femtosecond laser ablation of silicon (100) with thermal oxide thin films was studied in order to further understand the ablative properties of thin films and to evaluate their influence on the ablation of the substrate.
Femtosecond laser ablation of silicon (100) with thermal oxide thin films of varying thickness
2005 Quantum Electronics and Laser Science Conference ; 2 ; 910-912 Vol. 2
2005-01-01
2015604 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
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