This work demonstrates that optical techniques, particularly coherent interference effects, can not only reach nanoscale dimensions but also offer the many advantages of optical lithography including parallel writing of large numbers of nanostructures over large areas, alignment to underlying patterns, and cost-effectiveness.


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    Titel :

    There are no fundamental limits to optical nanolithography


    Beteiligte:
    Brueck, S.R.J. (Autor:in)


    Erscheinungsdatum :

    2004-01-01


    Format / Umfang :

    87119 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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