To fulfil metrological requirements of profiling aspheric surfaces, a very-large-scale phase measuring interferometric system is presented that has been developed at Korea Advanced Institute of Science and Technology. The measurement system comprises an interference microscope probe mounted on the z-axis and a precision xy-stage. The probe operates with principles of white light scanning interferometry to sample three-dimensional data in discrete form with a sub-nanometer resolution. A 640x480 pixel array CCD camera is used, thus the area of a single patch is limited within 0.64x0.48 mm with 1.0 /spl mu/m lateral resolution. The stage is controlled in the xy-directions with the aid of three plane mirror type heterodyne laser interferometers with 2.5 nanometer positioning resolution.
Very large scale phase measuring interferometry for profile measurement of aspheric surfaces with nanometer accuracy
1999-01-01
197838 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
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