To fulfil metrological requirements of profiling aspheric surfaces, a very-large-scale phase measuring interferometric system is presented that has been developed at Korea Advanced Institute of Science and Technology. The measurement system comprises an interference microscope probe mounted on the z-axis and a precision xy-stage. The probe operates with principles of white light scanning interferometry to sample three-dimensional data in discrete form with a sub-nanometer resolution. A 640x480 pixel array CCD camera is used, thus the area of a single patch is limited within 0.64x0.48 mm with 1.0 /spl mu/m lateral resolution. The stage is controlled in the xy-directions with the aid of three plane mirror type heterodyne laser interferometers with 2.5 nanometer positioning resolution.


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    Titel :

    Very large scale phase measuring interferometry for profile measurement of aspheric surfaces with nanometer accuracy


    Beteiligte:
    Seung-Woo Kim, (Autor:in) / In-Chul Chang, (Autor:in) / Dong-Sik Kim, (Autor:in) / Tae-Ho Kim, (Autor:in) / Seung-Bong Yoo, (Autor:in)


    Erscheinungsdatum :

    1999-01-01


    Format / Umfang :

    197838 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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