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    Titel :

    Lithography in UV photoresist using NSOM [5662-13]



    Kongress:

    International symposium; 5th, Fifth international symposium on laser precision microfabrication ; 2004 ; Nara, Japan



    Erscheinungsdatum :

    01.01.2004


    Format / Umfang :

    6 pages


    Anmerkungen:

    Also known as LPM 2004.




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Study on high-accuracy displacement interferometer for lithography application [5662-63]

    Cheng, Z. / Gao, H. / Chai, X. et al. | British Library Conference Proceedings | 2004


    The dry laser cleaning of photoresist residues on Si and ITO substrate [5662-75]

    Lee, K. C. / Lee, C. / SPIE et al. | British Library Conference Proceedings | 2004


    Laser machinable glass [5662-06]

    Koyo, H. / Shojiya, M. / Tsunetomo, K. et al. | British Library Conference Proceedings | 2004


    Characteristics of nanopatterning on photoresist using a near-field scanning optical microscope with an He-Cd laser [5662-09]

    Kwon, S. / Chang, W. / Jeong, S. et al. | British Library Conference Proceedings | 2004


    Performance of liquid xenon jet laser-produced-plasma light source for EUV lithography [5662-58]

    Suganuma, T. / Abe, T. / Komori, H. et al. | British Library Conference Proceedings | 2004