Zugriff

    Zugriff über TIB

    Verfügbarkeit in meiner Bibliothek prüfen

    Bestellung bei Subito €


    Exportieren, teilen und zitieren



    Titel :

    The dry laser cleaning of photoresist residues on Si and ITO substrate [5662-75]



    Kongress:

    International symposium; 5th, Fifth international symposium on laser precision microfabrication ; 2004 ; Nara, Japan



    Erscheinungsdatum :

    01.01.2004


    Format / Umfang :

    6 pages


    Anmerkungen:

    Also known as LPM 2004.




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Lithography in UV photoresist using NSOM [5662-13]

    Lin, Y. / Hong, M. H. / Wang, W. J. et al. | British Library Conference Proceedings | 2004


    Laser machinable glass [5662-06]

    Koyo, H. / Shojiya, M. / Tsunetomo, K. et al. | British Library Conference Proceedings | 2004


    Three-dimensional laser microfabrication (Plenary Paper) [5662-01]

    Sugioka, K. / SPIE / Japan Laser Processing Society et al. | British Library Conference Proceedings | 2004


    Ultrafast laser processing of transparent materials [5662-35]

    Wang, Z. B. / Hong, M. H. / Yin, L. et al. | British Library Conference Proceedings | 2004


    Characteristics of nanopatterning on photoresist using a near-field scanning optical microscope with an He-Cd laser [5662-09]

    Kwon, S. / Chang, W. / Jeong, S. et al. | British Library Conference Proceedings | 2004