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    Titel :

    Performance of liquid xenon jet laser-produced-plasma light source for EUV lithography [5662-58]



    Kongress:

    International symposium; 5th, Fifth international symposium on laser precision microfabrication ; 2004 ; Nara, Japan



    Erscheinungsdatum :

    2004-01-01


    Format / Umfang :

    6 pages


    Anmerkungen:

    Also known as LPM 2004.




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Development of EUV light source by CO~2-laser-produced Xe plasma [5662-57]

    Tanaka, H. / Akinaga, K. / Takahashi, A. et al. | British Library Conference Proceedings | 2004


    Lithography in UV photoresist using NSOM [5662-13]

    Lin, Y. / Hong, M. H. / Wang, W. J. et al. | British Library Conference Proceedings | 2004


    Laser machinable glass [5662-06]

    Koyo, H. / Shojiya, M. / Tsunetomo, K. et al. | British Library Conference Proceedings | 2004


    Study on high-accuracy displacement interferometer for lithography application [5662-63]

    Cheng, Z. / Gao, H. / Chai, X. et al. | British Library Conference Proceedings | 2004


    Three-dimensional laser microfabrication (Plenary Paper) [5662-01]

    Sugioka, K. / SPIE / Japan Laser Processing Society et al. | British Library Conference Proceedings | 2004