A gas flow control system for use in chemical beam epitaxial growth systems is described. This system employs a unique dual-valve control technology. Flux control and stability of better than 0.1% and switching speeds of the order of 1 s are demonstrated. An integrated system based on this type of control system is introduced
Progress in the design of CBE systems
Weiterentwicklungen im Entwurf von Systemen für die Chemiestrahlepitaxie (CBE)
1990
10 Seiten, 16 Quellen
Article (Journal)
English
PROZESSUEBERWACHUNG , PROZESSSTEUERUNG , GASSTROEMUNG , GASDRUCK , DRUCKREGELUNG , TRAEGERGAS , SPALTGAS , GASGEMISCH , FUELLGAS , REGELUNGSSYSTEM , STROEMUNGSGESCHWINDIGKEIT , VENTIL , MOLEKULARSTRAHLEPITAXIE , GASPHASENABSCHEIDUNG , CHEMISCHES VERFAHREN , MOLEKULARSTRAHL , GASSCHALTER , SYSTEMINTEGRATION , SYSTEMENTWURF , CHEMIESTRAHLEPITAXIE , CHEMIESTRAHLEPITAXIALWACHSTUM , INTEGRIERTES SYSTEM
Progress With Swath Ship Design Systems
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