In many respects, excimer lasers are almost ideal light sources for optical lithography applications. Their narrow bandwidth and high power provide tow of the main characteristics required of a light source for high- resolution imaging. However, for deep-UV lithography projection tools with no chromatic aberration in the imaging lens, even the very narrow bandwidth of an excimer laser may lead to image degradation.
Modeling the effects of excimer laser bandwidths on lithographic performance
Optical Microlithography XIII ; 2000 ; Santa Clara,CA,USA
Proc. SPIE ; 4000
2000-07-05
Conference paper
Electronic Resource
English
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