In many respects, excimer lasers are almost ideal light sources for optical lithography applications. Their narrow bandwidth and high power provide tow of the main characteristics required of a light source for high- resolution imaging. However, for deep-UV lithography projection tools with no chromatic aberration in the imaging lens, even the very narrow bandwidth of an excimer laser may lead to image degradation.


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    Title :

    Modeling the effects of excimer laser bandwidths on lithographic performance


    Contributors:

    Conference:

    Optical Microlithography XIII ; 2000 ; Santa Clara,CA,USA


    Published in:

    Publication date :

    2000-07-05





    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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