Recently, considerable progress has been made in the development of ArF excimer lasers for 193 nm lithography. A line-narrowed ArF excimer laser with a bandwidth of < 0.7 pm can be used with a refractive lens system. In this paper, we present a line-narrowed ArF excimer laser which we have developed for 193 nm lithography. This laser produces an output power of over 5 W with a 0.6 pm FWHM bandwidth at 1 kHz operation.


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    Title :

    Line-narrowed ArF excimer laser for 193-nm lithography


    Contributors:

    Conference:

    Optical Microlithography XII ; 1999 ; Santa Clara,CA,USA


    Published in:

    Publication date :

    1999-07-26





    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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