Surface deformation is the crucial factor for the imaging performance of the lithographic object lens in the manufacturing process. Simulation of surface deformation can predict the degradation of the wavefront error caused by surface deformation, find the lens which is most sensitive to the surface deformation even in the design phase. We develop a method to simulate the surface deformation by Zernike polynomials in this paper. In fact, the surface deformation generated in the manufacturing process is random. However, it does not mean that they have no rules at all. We analysize the Zernike coefficients distribution of the interferential data, and build a model to simulate the surface deformation. The model can generate random-surface-deformation according to the input RMS/PV bound in the form of INT file type, which can be added to the lens surface directly in the optical design program CODEV. The results show that the surface deformation generated by our model can simulate the interferential data very well.


    Access

    Check access

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Simulation of surface deformation for the lithographic object lens by Zernike polynomials


    Contributors:
    Cong, Bin (author) / Yi, Tong Sheng (author)

    Conference:

    Selected Papers from Conferences of the Photoelectronic Technology Committee of the Chinese Society of Astronautics 2014, Part II ; 2014 ; China,China


    Published in:

    Publication date :

    2015-04-13





    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



    Modeling a Temporally Evolving Atmosphere with Zernike Polynomials

    Putnam, I. | British Library Conference Proceedings | 2013




    Aberrated laser beams in terms of Zernike polynomials [2870-06]

    Alda, J. / Alonso, J. / Bernabeu, E. et al. | British Library Conference Proceedings | 1996