World-wide interest in germanium-on-silicon photonics has grown enormously during the past few years. We report on our study of germanium deposition for which we found that there is potential to engineer films with significant increases in hole mobility. In addition, we report on our development of wet-etch techniques to pattern thin films and to form tapered regions of Ge, both important for the fabrication of Ge photonic devices.


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    Title :

    Germanium devices for integrated photonic circuits


    Contributors:

    Conference:

    Nanophotonics and Macrophotonics for Space Environments VIII ; 2014 ; San Diego,California,United States


    Published in:

    Publication date :

    2014-09-17





    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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