Ion plating is a high-energy or plasma deposition method which essentially consists of sputtering and ion implantation (thermal evaporation with ionization). During ion plating, deposition is by ions as opposed to atoms. Ion plating has the two distinct characteristics of high throwing power and high kinetic energy. The high throwing power is responsible for coating complex geometrical surfaces with a uniform film without rotation. The high kinetic energy of the ion flux forms a graded interface; as a result a very adherent film is formed. Mechanical tests (tensile, fatigue, and friction) show a very strong adherence of the film and even an increase in mechanical properties such as tensile strength and fatigue life.


    Access

    Check access

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Ion Plating


    Additional title:

    Sae Technical Papers


    Contributors:

    Conference:

    National Automobile Engineering Meeting ; 1973



    Publication date :

    1973-02-01




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    PLATING

    Nixon, C. F. | SAE Technical Papers | 1960


    Plating, Cadmium

    SAE Technical Papers | 2013


    Plating partnership

    Emerald Group Publishing | 2006


    PLATING, GOLD

    SAE Technical Papers | 1994


    CADMIUM PLATING

    SAE Technical Papers | 1987