In this paper, we present a novel way of texturing glass facilitated by ZnO:Al thin film as sacrificial layer for thin film silicon solar cell application. We name this technique zinc oxide‐induced texturing (ZIT). The texturing of glass was achieved by wet etching of ZnO:Al covered glass with HF and HNO 3 as etchants. We investigated the influence of the ZnO:Al layer sputtering condition, the layer thickness, and the etchant composition on the surface morphology of the textured glass. We demonstrate that we are able to control the roughness of the ZIT glass over a wide roughness range, ranging from 20 to 400 nm. Highly efficient microcrystalline silicon n‐i‐p solar cells were deposited on ZIT glass. The influence of the substrate morphology on the solar cell performance is also discussed. The highest efficiency for a single junction n‐i‐p microcrystalline silicon solar cell obtained in this work is 10.64% (Active area). Copyright © 2014 John Wiley & Sons, Ltd. We developed a novel glass texturing technique called zinc oxide‐induced texturing. With this technique, a wide range of morphologies can be achieved on glass easily and fast. Using substrates textured with this technique, we investigated the effect of the morphology on the performance of substrate n‐i‐p microcrystalline silicon solar cells. Highly efficient solar cells were deposited on top of these glass substrates. The best solar cell achieved in this work has an efficiency of 10.64% active area.


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    Title :

    A novel way of texturing glass for microcrystalline silicon thin film solar cells application



    Published in:

    Publication date :

    2015




    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English



    Classification :

    BKL:    53.36 Energiedirektumwandler, elektrische Energiespeicher