Studies on the structural properties of SiO:H films prepared from (SiH4+CO2+He) plasma in RF-PECVD
Solar energy materials & solar cells ; 93 , 5 ; 588-597
2009
Article (Journal)
English
Studies on the structural properties of SiO:H films prepared from (SiH4+CO2+He) plasma in RF-PECVD
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