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    Title :

    Studies on the structural properties of SiO:H films prepared from (SiH4+CO2+He) plasma in RF-PECVD


    Contributors:

    Published in:

    Publication date :

    2009



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English



    Classification :

    BKL:    50.70 Energie: Allgemeines / 52.56 Regenerative Energieformen, alternative Energieformen / 52.52 Thermische Energieerzeugung, Wärmetechnik / 53.36 Energiedirektumwandler, elektrische Energiespeicher






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