Effect of gas flow rates on PECVD-deposited nanocrystalline silicon thin film and solar cell properties
Solar energy materials & solar cells ; 92 , 4
2008
Article (Journal)
English
Thin film silicon n–i–p solar cells deposited by VHF PECVD at 100°C substrate temperature
Online Contents | 2009
|Thin film silicon n–i–p solar cells deposited by VHF PECVD at 100°C substrate temperature
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|High Efficiency Semitransparent Silicon-Carbon Based Solar Cells Deposited by PECVD
British Library Conference Proceedings | 1994
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