A very shallow multilayer etched-grating is proposed as a wavelength demultiplexer. Two different configurations are compared for diffraction efficiency and resolution. Single-step-etch fabrication designs are presented and modeled for their grating efficiency and overall performance.


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    Title :

    A shallow-etched multilayer grating-based wavelength demultiplexer in SOI


    Contributors:
    Bisaillon, E. (author) / Laniel, J. (author) / Jugessur, A. (author) / Kirk, A.G. (author)


    Publication date :

    2005-01-01


    Size :

    223020 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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