We photochemically modified silicones for fabrication of SiO/sub 2/ by a 157-nm F/sub 2/ laser irradiation. Humps of SiO/sub 2/ at a height of several microns could be fabricated on silicone rubber. Micro-patterning of silicons films was also fabricated by immersing the modified films in hydrogen fluoride solution. The photochemical modifications did not take place when a 193-nm ArF laser was used.


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    Title :

    F/sub 2/ laser processing of silicone


    Contributors:
    Okoshi, M. (author) / Takao, H. (author) / Inoue, N. (author)


    Publication date :

    2003-01-01


    Size :

    88953 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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