We photochemically modified silicones for fabrication of SiO/sub 2/ by a 157-nm F/sub 2/ laser irradiation. Humps of SiO/sub 2/ at a height of several microns could be fabricated on silicone rubber. Micro-patterning of silicons films was also fabricated by immersing the modified films in hydrogen fluoride solution. The photochemical modifications did not take place when a 193-nm ArF laser was used.
F/sub 2/ laser processing of silicone
2003-01-01
88953 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
F~2 laser processing of silicone
British Library Conference Proceedings | 2003
|Fluorine laser writes waveguides in silicone
British Library Online Contents | 2005
British Library Conference Proceedings | 2003
|Silicone Fluids as Internal Processing Aids for Thermoplastics
Kraftfahrwesen | 1978
|F~2 laser ablation of silicone rubber [5662-38]
British Library Conference Proceedings | 2004
|