We photochemically modified silicones for fabrication of SiO/sub 2/ by a 157-nm F/sub 2/ laser irradiation. Humps of SiO/sub 2/ at a height of several microns could be fabricated on silicone rubber. Micro-patterning of silicons films was also fabricated by immersing the modified films in hydrogen fluoride solution. The photochemical modifications did not take place when a 193-nm ArF laser was used.


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    Titel :

    F/sub 2/ laser processing of silicone


    Beteiligte:
    Okoshi, M. (Autor:in) / Takao, H. (Autor:in) / Inoue, N. (Autor:in)


    Erscheinungsdatum :

    2003-01-01


    Format / Umfang :

    88953 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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