This paper details the cost and schedule tools, methods, and processes APL used to satisfy the 32 guidelines of EIA-748 National Defense Industrial Association (NDIA) Integrated Program Management Division (IPMD) EVMS Intent Guide and Systems Acceptance Guide NASA uses to determine EVMS capability and compliance. It explores the following: • Establishing an early relationship with NASA to understand expectations, process areas, and success criteria • Understating the review roadmap used by NASA for integrated baseline reviews, progress assessment visits, progress assessment reviews, self-assessment reviews • Creating buy-in from the organization and navigating the pitfalls of “management by consensus” versus “management by dictate” • Tool acquisition, development, and implementation for cost and schedule management • Reinforcing the role of the control account manager (CAM) in the EVM process, development of training material, and CAM-specific tools for success • Creating compliant methods for organizing, planning, and integrating cost and schedule • Developing compliant approaches for quantifying performance, analyzing data, and implementing corrective actions • NASA process team construct and interview process • The importance and utility of the Project Management Control System (PMCS) • Instilling the help of APL support organizations and their importance to the process • When to seek outside consulting support and the roles they can play • Successfully closing out corrective actions and planning for surveillance reviews. We hope this paper provides an informative perspective from a contractor's point of view that will help others navigate a NASA-led EVMS compliance review.


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    Title :

    Navigating an earned value management validation led by NASA: A contractor's perspective and helpful hints


    Contributors:


    Publication date :

    2017-03-01


    Size :

    3279887 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English




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