In case of metallic hole arrays we need to establish how structures transmit, reflect and absorb light. We fabricated hole arrays using a focused ion beam etching system (FBI DB235). The period of the array was 430/spl plusmn/5 nm, the hole diameter 250/spl plusmn/5 nm and the thickness of the silver 180/spl plusmn/5 nm. We made arrays with relatively large dimensions, 1 mm/sup 2/ so as to make the measurement of the reflectivity possible with existing facilities. We next performed optical measurements to find the transmittance and the reflectivity as a function of incident angle and incident frequency. In this way we are able to build up a map of the dispersion of the surface plasmon (SP) modes associated with the enhanced transmission.
Transmission, reflection and absorption of light incident on metallic hole arrays
2003-01-01
96226 byte
Conference paper
Electronic Resource
English
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