Access

    Check access

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    High repetition rate KrF excimer laser for microphotolithography


    Contributors:
    Kakuno, T. (author) / Enami, T. (author) / Kakizaki, K. (author)


    Publication date :

    1995-01-01


    Size :

    168312 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



    5 kHz high repetition rate excimer laser

    Takagi, S. / Kakizaki, K. / Okamoto, N. et al. | IEEE | 1995


    High-repetition-rate excimer laser for micromachining [4971-16]

    Herbst, L. / Klaft, I. / Wenzel, T. et al. | British Library Conference Proceedings | 2003


    High-repetition-rate ArF excimer laser for microlithography [4088-80]

    Wakabayashi, O. / Enami, T. / Ishii, K. et al. | British Library Conference Proceedings | 2000



    kHz repetition rate operation of excimer laser [2889-518]

    Park, H. / Lee, C. / SPIE | British Library Conference Proceedings | 1996