We present a single-step technique for defining channel waveguides with internal Bragg gratings in photosensitive germanosilica-on-silicon using two interfering focussed UV beams. Early devices exhibit reflection intensities of 80% with <0.15 nm bandwidth.
Single-step definition of channel waveguides with integral Bragg gratings in germanosilica-on-silicon wafers by direct UV writing
2003-01-01
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Conference paper
Electronic Resource
English
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