We present a single-step technique for defining channel waveguides with internal Bragg gratings in photosensitive germanosilica-on-silicon using two interfering focussed UV beams. Early devices exhibit reflection intensities of 80% with <0.15 nm bandwidth.


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    Title :

    Single-step definition of channel waveguides with integral Bragg gratings in germanosilica-on-silicon wafers by direct UV writing


    Contributors:
    Gawith, C.B.E. (author) / Emmerson, G.D. (author) / Watts, S.P. (author) / Albanis, V. (author) / Ibsen, M. (author) / Williams, R.B. (author) / Smith, P.G.R. (author) / McMeekin, S.G. (author) / Bonar, J.R. (author) / Laming, R.I. (author)


    Publication date :

    2003-01-01


    Size :

    97737 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English




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