Fast optical scanning deflectometry has been introduced for the measurement of the surface figure of optical surfaces. The measurement principle is based on physical ray tracing by means of a narrow laser beam deflected by an oscillating mirror and a large lens arranged for telecentric scanning. A new design of an instrument capable of measuring 12-inch wafers within 60 s and with a slope resolution better 1 /spl mu/rad is presented.


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    Title :

    Wafer topography measurement by fast optical scanning deflectometry


    Contributors:
    Krey, S. (author) / Peter, F. (author) / Dumitrescu, E. (author) / van Amstel, W.D. (author) / Klaver, R.G. (author) / Lous, E.J. (author)


    Publication date :

    2003-01-01


    Size :

    48157 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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