Fast optical scanning deflectometry has been introduced for the measurement of the surface figure of optical surfaces. The measurement principle is based on physical ray tracing by means of a narrow laser beam deflected by an oscillating mirror and a large lens arranged for telecentric scanning. A new design of an instrument capable of measuring 12-inch wafers within 60 s and with a slope resolution better 1 /spl mu/rad is presented.
Wafer topography measurement by fast optical scanning deflectometry
2003-01-01
48157 byte
Conference paper
Electronic Resource
English
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