The TJNAF-FEL presents unique opportunities for the study of pulsed laser deposition due to its parameters: sub-picosecond pulses, high average power, high repetition rate and tunability. This is demonstrated through optical spectroscopy and growth of thin films.
Pulsed laser deposition with the Thomas Jefferson national accelerator facility free electron laser: benefits of sub-picosecond pulses with high repetition rate
2003-01-01
149386 byte
Conference paper
Electronic Resource
English
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