The TJNAF-FEL presents unique opportunities for the study of pulsed laser deposition due to its parameters: sub-picosecond pulses, high average power, high repetition rate and tunability. This is demonstrated through optical spectroscopy and growth of thin films.


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    Title :

    Pulsed laser deposition with the Thomas Jefferson national accelerator facility free electron laser: benefits of sub-picosecond pulses with high repetition rate


    Contributors:
    Reilly, A. (author) / Allmond, C. (author) / Watson, S. (author) / Gammon, J. (author) / Kim, J.-G. (author) / Shinn, M. (author)


    Publication date :

    2003-01-01


    Size :

    149386 byte



    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English





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