A method for improving the resolution of a lithographic system by an arbitrary amount (with no visibility reduction for incoherent mask methods) is proposed and demonstrated experimentally. The method simply relies on the sharpened features available through N-photon detection.


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    Title :

    Super-resolution by nonlinear optical lithography


    Contributors:
    Bentley, S.J. (author) / Boyd, R.W. (author)


    Publication date :

    2003-01-01


    Size :

    137294 byte



    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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