A seamless instrument cluster is provided herein, and a method for providing a seamless instrument cluster as well. The seamless instrument cluster includes an antireflective (AR) film. The AR films may be provided with an airgap disposed between. Also discussed herein is providing an instrument cluster with an applique with a fade pattern. The aspects disclosed herein may be implemented with an instrument cluster employing a neutral density (ND) filter situated between an antiglare surface on a front layer of the applique and a rear layer of an ink.
SEAMLESS INSTRUMENT CLUSTER
2017-03-02
Patent
Electronic Resource
English
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