PROBLEM TO BE SOLVED: To provide a cleaning water supply system which supplies cleaning water to a waste gas cleaning device for a ship and has a high degree-of-freedom of design.SOLUTION: An open mode cleaning water supply sequence 14, which uses cleaning water introduced from a sea chest 17 in an exhaust gas cleaning device 12, and after use, discharges cleaning water outside a hull is provided. In the open mode cleaning water supply sequence 14, cleaning water introduced from an exterior of the hull is pumped by a first pump P1 which is located below a light draft line WL. Cleaning water pumped by the first pump P1 is pressurized by a second pump P2 which is located in an engine room above the light draft line WL, and is delivered to the exhaust gas cleaning device 12.SELECTED DRAWING: Figure 1
【課題】船舶用の排ガス洗浄装置へ洗浄水を供給する設計上の自由度の高い洗浄水供給システムを提供する。【解決手段】シーチェスト17から取り込んだ洗浄水を排ガス洗浄装置12で使用し、使用後には、船体外へ排出するオープンモードの洗浄水供給系列14を設ける。オープンモードの洗浄水供給系列14では、軽荷喫水線WLよりも下に配置された第1ポンプP1で、船体外から取り込まれた洗浄水を汲み上げる。第1ポンプP1で汲み上げられた洗浄水を、軽荷喫水線WLよりも上の機関室に配置される第2ポンプP2で加圧し、排ガス洗浄装置12へ送出する。【選択図】図1
CLEANING WATER SUPPLY SYSTEM
洗浄水供給システム
2017-01-26
Patent
Electronic Resource
Japanese
IPC: | B63H Schiffsantrieb oder Steuerung der Schiffe , MARINE PROPULSION OR STEERING / B01D SEPARATION , Trennen / F01N GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL , Schalldämpfer oder Auspuffvorrichtungen für Gase von Kraft- und Arbeitsmaschinen oder von Kraftmaschinen allgemein |
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