The invention provides a clean room for semiconductor manufacturing and a semiconductor manufacturing factory, and the clean room comprises a plurality of first production devices, the projections of the access ports of the first production devices on the ground are located on the same straight line; and the separating wall surrounds the plurality of first production devices, and access ports of the plurality of first production devices are exposed out of the separating wall. According to the clean room for semiconductor manufacturing and the semiconductor manufacturing factory, the adjacent production sections share the crown block track, the space utilization rate of the clean environment can be increased, the wafer transportation efficiency can be improved, the number of the crown block tracks is reduced, and the cost is saved.

    本申请提供一种用于半导体制造的洁净室及半导体制造工厂,所述洁净室包括:若干第一生产设备,所述若干第一生产设备的出入端口在地面的投影位于一条直线上;隔离墙,包围所述若干第一生产设备,其中,所述若干第一生产设备的出入端口暴露于所述隔离墙外。本申请提供一种用于半导体制造的洁净室及半导体制造工厂,相邻的生产区间共用天车轨道,可以提高洁净环境的空间利用率,提高晶圆运输效率,并且减少天车轨道数量,节省成本。


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    Title :

    Clean room for semiconductor manufacturing and semiconductor manufacturing factory


    Additional title:

    一种用于半导体制造的洁净室及半导体制造工厂


    Contributors:
    JIANG WANG (author) / ZHOU YIZHONG (author) / SUN JUNLI (author) / FANG XIAOFEI (author) / BAI XUE (author)

    Publication date :

    2024-03-29


    Type of media :

    Patent


    Type of material :

    Electronic Resource


    Language :

    Chinese


    Classification :

    IPC:    E04H Gebäude oder ähnliche Bauwerke für besondere Zwecke , BUILDINGS OR LIKE STRUCTURES FOR PARTICULAR PURPOSES / B66C Krane , CRANES / H01L Halbleiterbauelemente , SEMICONDUCTOR DEVICES





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