The invention discloses a two-stage lifting and rotating lifting platform which comprises a base, a first lifting mechanism, a second lifting mechanism and an anti-falling mechanism, a first fixing ring is arranged at the top of the base, a second fixing ring is arranged on the inner side of the first lifting platform, a first-stage lifting platform is arranged at the top of the first fixing ring, and a second-stage lifting platform is arranged at the top of the second fixing ring. The first lifting mechanism is arranged between the base and the first fixing ring and used for adjusting the height of the first-stage lifting table, and the second lifting mechanism is arranged between the base and the second fixing ring. By arranging the anti-falling mechanism, when the first-stage lifting platform accidentally falls down, the first-stage lifting platform can be supported through the supporting rod, so that the situation that the first-stage lifting platform directly falls down and a performer on the first-stage lifting platform is injured can be avoided, and meanwhile when the first-stage lifting platform normally ascends and descends, the first-stage lifting platform is prevented from falling down. And the anti-falling mechanism does not influence the normal operation of the device.
本发明公开了二级升降旋转的升降台,包括底座、第一升降机构、第二升降机构和防坠落机构,所述底座顶部设有第一固定环,所述第一升降台内侧设有第二固定环,所述第一固定环顶部设有一级升降台,所述第二固定环顶部设有二级升降台,所述第一升降机构设置于底座与第一固定环之间,所述第一升降机构用于对一级升降台的高度进行调节,所述第二升降机构设置于底座与第二固定环之间。本发明通过设置防坠落机构,在一级升降台意外向下坠落时,可以通过支撑杆对一级升降台进行支撑,从而可以避免一级升降台直接坠落而从而使以及升降台上的表演者受伤,同时在一级升降台正常升降时,防坠落机构不会影响装置的正常运行。
Two-stage lifting and rotating lifting platform
二级升降旋转的升降台
2023-11-24
Patent
Electronic Resource
Chinese
IPC: | B66F HOISTING, LIFTING, HAULING, OR PUSHING, NOT OTHERWISE PROVIDED FOR, e.g. DEVICES WHICH APPLY A LIFTING OR PUSHING FORCE DIRECTLY TO THE SURFACE OF A LOAD , Hub-, Verhol- oder Schubvorrichtungen, soweit nicht anderweitig vorgesehen, z.B. Vorrichtungen mit unmittelbarer Krafteinwirkung auf die Last |