The invention discloses self-pressurization space spraying equipment. The self-pressurization space spraying equipment comprises a drive component, a gas generation source and a spraying component, wherein the drive component comprises a cavity structure for storing liquid material to be sprayed and a piston held in the cavity structure and in contact with the liquid material; the gas generation source comprises a gas generation source body structure connected with the drive component, gas production medicament held in the gas generation source body mechanism, and a push piston for generating high-pressure gas; the spraying component comprises a rotational flow cavity connected with the cavity structure and a rotational flow core arranged in the rotational flow cavity. The self-pressurization space spraying equipment has advantages that pressure needed for liquid spraying is automatically generated by the spraying equipment, and the self-pressurization space spraying equipment only needs the outside to provide an electric initiating signal and does not need the outside to supply pressure and electricity. Under a vacuum condition, the spray liquid material can be atomized completely to be uniformly sprayed to the target surface. When being used in the space, surface treatment for satellite surface equipment is realized through spraying the liquid material so as to improve the surface coating performance thereof; the self-pressurization space spraying equipment can be used for the on-orbit assembly, on-orbit construction and on-orbit lifetime extension of a spacecraft.


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    Title :

    Self-pressurization space spraying equipment


    Contributors:
    MENG BO (author) / LI ZHI (author) / HUANG JIANBIN (author) / SUN YUCHENG (author) / CHEN WEICHUN (author) / YIN JIANFENG (author) / HAN XU (author)

    Publication date :

    2015-04-01


    Type of media :

    Patent


    Type of material :

    Electronic Resource


    Language :

    English


    Classification :

    IPC:    B64G Raumfahrt , COSMONAUTICS




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