This paper compares the performance of different dispersion engineering methods in slow light photonic crystal waveguides, i.e., geometrical parameter optimization and topology optimization. In both methods, the design robustness is enforced by considering the dilated, intermediate and eroded designs corresponding to the under‐, standard‐ and over‐etching processes in the manufacturing process. For v g *  = c/50, the parameter optimized design achieves a normalized group index bandwidth product of 0.33 and the topology optimized design achieves 0.53. The numerical results illustrate that waveguides with optimized hole sizes and positions can be efficient for dispersion engineering but that large improvements are possible if irregular geometries are allowed using topology optimization.


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    Title :

    Comparison between different dispersion engineering methods in slow light photonic crystal waveguides


    Contributors:

    Conference:

    THE FOURTH INTERNATIONAL WORKSHOP ON THEORETICAL AND COMPUTATIONAL NANOPHOTONICS: TaCoNa‐Photonics 2011 ; 2011 ; Bad Honnef, (Germany)


    Published in:

    AIP Conference Proceedings ; 1398 , 1 ; 180-182


    Publication date :

    2011-10-03


    Size :

    3 pages





    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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