INFRARED NANOSECOND LASER ABLATION OF SILICON: THE SPATIAL MULTI-PULSE ENHANCEMENT EFFECT AND ITS DEPENDENCE ON LASER PULSE DURATION - TECHNICAL COMMUNICATION
MACHINING SCIENCE AND TECHNOLOGY ; 13 , 3 ; 427-436
2009-01-01
10 pages
Article (Journal)
English
DDC: | 671.35 |
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