Access

    Access via TIB

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Using Destructive Optical Interference in Semiconductor Lithography


    Contributors:

    Published in:

    Publication date :

    2006-01-01


    Size :

    6 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English


    Classification :

    DDC:    621.36



    ONCOMING LIGHT REDUCTION USING DESTRUCTIVE INTERFERENCE

    MCHENRY JACOB | European Patent Office | 2023

    Free access

    Optical metrology of semiconductor wafers in lithography

    den Boef,A.J. / ASML,Veldhoven,NL | Automotive engineering | 2012



    Nano-patterning by laser interference lithography

    Xie, Q. / Hong, M.H. / Van, L.H. et al. | IEEE | 2003


    Nano-patterning by laser interference lithography

    Xie, Q. / Hong, M. H. / Van, L. H. et al. | British Library Conference Proceedings | 2003