Access

    Access via TIB

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Characteristics of nanopatterning on photoresist using a near-field scanning optical microscope with an He-Cd laser [5662-09]



    Conference:

    International symposium; 5th, Fifth international symposium on laser precision microfabrication ; 2004 ; Nara, Japan



    Publication date :

    2004-01-01


    Size :

    5 pages


    Remarks:

    Also known as LPM 2004.




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Lithography in UV photoresist using NSOM [5662-13]

    Lin, Y. / Hong, M. H. / Wang, W. J. et al. | British Library Conference Proceedings | 2004


    The dry laser cleaning of photoresist residues on Si and ITO substrate [5662-75]

    Lee, K. C. / Lee, C. / SPIE et al. | British Library Conference Proceedings | 2004


    Laser machinable glass [5662-06]

    Koyo, H. / Shojiya, M. / Tsunetomo, K. et al. | British Library Conference Proceedings | 2004


    Laser micromachining of optical devices (Invited Paper) [5662-84]

    Kopitkovas, G. / Lippert, T. / David, C. et al. | British Library Conference Proceedings | 2004


    Deformation characteristics of plastics in YAG laser forming [5662-93]

    Okamoto, Y. / Miyamoto, I. / Uno, Y. et al. | British Library Conference Proceedings | 2004