Access

    Access via TIB

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Process conditions for the fabrication of subwavelength scale structures by x-ray lithography in PMMA films [5450-09]



    Conference:

    Technical conference, Photonic crystal materials and nanostructures ; 2004 ; Strasbourg, France



    Publication date :

    2004-01-01


    Size :

    9 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Fabrication of two-dimensional photonic crystals of nonspherical atoms by holographic lithography [5450-10]

    Moon, J. H. / Pine, D. J. / Yang, S.-M. et al. | British Library Conference Proceedings | 2004


    Propagation effects of surface waves on periodic chromium structures [5450-16]

    Triebel, P. / Weissbrodt, P. / Nolte, S. et al. | British Library Conference Proceedings | 2004


    Fabrication of 3D photonic crystals with two-beam holographic technique [5450-58]

    Liu, Y. / Liu, S. / Zhang, X. et al. | British Library Conference Proceedings | 2004


    Silicon-on-insulator photonic bandgap structures for future microphotonic devices [5450-36]

    Hadji, E. / Cluzel, B. / Sotta, D. et al. | British Library Conference Proceedings | 2004


    Large-area photonic crystals [5450-11]

    Ruhl, T. / Spahn, P. / Hellmann, G. P. et al. | British Library Conference Proceedings | 2004