1–4 von 4 Ergebnissen
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    The 200 W power high-stability KrF excimer laser

    Hoshino, H. / Kodama, Y. / Takahashi, K. et al. | IEEE | 2001

      The 200W Power High-Stability KrF Excimer Laser

      Hoshino, H. / Kodama, Y. / Takahashi, K. et al. | British Library Conference Proceedings | 2001

    High-average-power EUV light source for the next-generation lithography by laser-produced Xe plasma [5537-01]

    Nakano, M. / Abe, T. / Endo, A. et al. | British Library Conference Proceedings | 2004

    Design of high-average-power clean EUV light source based on laser-produced Xenon plasma [5196-29]

    Endo, A. / Abe, T. / Suganuma, T. et al. | British Library Conference Proceedings | 2004

    Performance of liquid xenon jet laser-produced-plasma light source for EUV lithography [5662-58]

    Suganuma, T. / Abe, T. / Komori, H. et al. | British Library Conference Proceedings | 2004