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    Titel :

    Design of high-average-power clean EUV light source based on laser-produced Xenon plasma [5196-29]


    Beteiligte:
    Endo, A. (Autor:in) / Abe, T. (Autor:in) / Suganuma, T. (Autor:in) / Imai, Y. (Autor:in) / Someya, H. (Autor:in) / Hoshino, H. (Autor:in) / Masaki, N. (Autor:in) / Soumagne, G. (Autor:in) / Komori, H. (Autor:in) / Takabayashi, Y. (Autor:in)

    Kongress:

    Conference, Laser-generated and other laboratory X-ray and EUV sources, optics and applications; Laser-generated and other laboratory X-ray and EUV sources, optics and applications



    Erscheinungsdatum :

    2004-01-01


    Format / Umfang :

    7 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    High-power laser-produced plasma source for nanolithography [5196-10]

    Forber, R. A. / Gaeta, C. J. / Rieger, H. et al. | British Library Conference Proceedings | 2004


    Study on EUV emission properties of laser-produced plasma at ILE, Osaka [5196-33]

    Nakai, M. / Nishimura, H. / Shigemori, K. et al. | British Library Conference Proceedings | 2004


    X-pinch source size measurements [5196-04]

    Pikuz, S. A. / Song, B. M. / Shelkovenko, T. A. et al. | British Library Conference Proceedings | 2004


    High-efficiency tin-based EUV sources [5196-14]

    Richardson, M. C. / Koay, C.-S. / Keyser, C. K. et al. | British Library Conference Proceedings | 2004


    Overview of x-ray spectroscopy of laser-produced plasmas (Invited Paper) [5196-19]

    Rosmej, F. B. / Faenov, A. Y. / Pikuz, T. A. et al. | British Library Conference Proceedings | 2004