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    Titel :

    High-average-power EUV light source for the next-generation lithography by laser-produced Xe plasma [5537-01]


    Beteiligte:

    Kongress:

    Conference, X-ray sources and optics ; 2004 ; Denver, CO



    Erscheinungsdatum :

    2004-01-01


    Format / Umfang :

    10 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Status of the liquid-metal-jet-anode electron-impact x-ray source [5537-12]

    Otendal, M. / Tuohimaa, T. / Hemberg, O. E. et al. | British Library Conference Proceedings | 2004


    Design of high-average-power clean EUV light source based on laser-produced Xenon plasma [5196-29]

    Endo, A. / Abe, T. / Suganuma, T. et al. | British Library Conference Proceedings | 2004


    The VSX as a laboratory soft x-ray source for scientific analyses [5537-06]

    Antoshko, Y. / Chapman, I. / Dotten, R. et al. | British Library Conference Proceedings | 2004


    Extremely soft x-ray generator and its applications [5537-10]

    Sato, E. / Obata, F. / Takahashi, K. et al. | British Library Conference Proceedings | 2004


    High-power x-ray point source for next-generation lithography [3767-03]

    Turcu, I. C. E. / Forber, R. A. / Grygier, R. K. et al. | British Library Conference Proceedings | 1999