New type of Monk-Gillieson monochromator capable of covering a 0.7- to 25-nm range [4782-41]
Temperature-dependence perturbations on LTP measurements [4782-04]
Microstructure of Mo/Si multilayers with barrier layers [4782-25]
Wave-optical analysis of submicron focusing of hard x-ray beams by reflective optics [4782-36]
Toroidal mirror for single-pulse experiments on ID09B [4782-18]
Topography measurement of nanometer synchrotron optics [4782-02]
Review of multilayer normal-incidence gratings operating at 9- to 40-nm wavelengths [4782-31]
Performance of cryogenically cooled monochromators at SPring-8 [4782-17]
Status of small d-spacing x-ray multilayer development at Osmic [4782-21]
Nickel-plated invar mirrors for synchrotron radiation beam lines [4782-12]
The present state of Kirkpatrick-Baez mirror systems at the ESRF [4782-10]
Profile coating of KB mirrors at the Advanced Photon Source [4782-13]
Reflectivity and stability of Cr/Sc multilayers for the soft x-ray range [4782-38]
EUV multilayer mirrors with tailored spectral reflectivity [4782-26]
Heat stability of Mo/Si multilayers inserted with silicon oxide layers [4782-37]
Highly reflective uranium mirrors for astrophysics applications [4782-29]
Wideband multilayer mirrors for medium to hard x-ray applications [4782-23]
New process for x-ray mirror image quality improvement [4782-06]
Recent developments of multilayer mirror optics for laboratory x-ray instrumentation [4782-44]
Applications of x-ray intensity interferometry [4782-16]